Fig. 1. Magnet layout and linear optical parameters of one period HALF lattice

Fig. 2. Dynamic aperture of the HALF storage ring

Fig. 3. Schematic layout of injection devices for the bump injection scheme with anti-septum (K2)

Fig. 4. Element layout of anti-septum injection scheme

Fig. 5. Position of the first six turns of injection beam

Fig. 6. Injection efficiency of anti-septum injection scheme

Fig. 7. Influence of anti-septum injection on the stored beam

Fig. 8. Schematic layout of injection devices for the multipole kicker injection scheme

Fig. 9. Field distribution of nonlinear kicker

Fig. 10. First turn trajectory of the injection particle and specific parameters of the injection scheme

Fig. 11. Accumulation process after pulsed multipole injection

Fig. 12. Injection efficiency of pulsed multipole injection with error

Fig. 13. Influence of pulsed multipole injection on the stored beam

Fig. 14. Schematic layout of injection devices for the longitudinal injection scheme

Fig. 15. Upper and lower boundaries of longitudinal phase space in longitudinal injection

Fig. 16. δ₀ and δ_s change with high frequency cavity voltage

Fig. 17. Accumulation process of injection beam in longitudinal injection