Chinese Journal of Lasers, Volume. 16, Issue 1, 59(1989)
Preparation of Ni and NiSi2 films on polysilicon by laser-induced aluminothermic reaction
References(4)
[1] [1] S. P. Murarka, Silicides For VLSI Applications (Academic, New York, 1983)
[3] [3] S. P. Murarka, J. Vac. Sci. Technol., 17, 775 (1980)
[4] [4] G. V. SamsoDor, Handbook of Refractory Compounds (IFI/Plenum, New York, 1980).
[5] [5] W. G. Moffat,in "The Handbook of Binury Phase actefrDiagrams" (General electric CO Schene-ctady, New York, 1978)
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Li Ding, Zhou Zhengzhuo, Zheng Yongjian, Gong Huanming, Qiu Μingxin, Lin Chenglu. Preparation of Ni and NiSi2 films on polysilicon by laser-induced aluminothermic reaction[J]. Chinese Journal of Lasers, 1989, 16(1): 59
Paper Information
Category: laser manufacturing
Received: --
Accepted: --
Published Online: Aug. 13, 2012
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