Component and performance evolution of Zr filters induced by annealing and synchrotron radiation in EUV range

Jingtao Zhu; Sheng Guo; Jiaoling Zhao; Xiaoran Li; Jianda Shao; Hongjun Zhou; Tonglin Huo

doi:10.3788/COL202523.033401

Chinese Optics Letters, Volume. 23, Issue 3, 033401(2025)

Component and performance evolution of Zr filters induced by annealing and synchrotron radiation in EUV range

Jingtao Zhu^1,2、*, Sheng Guo^1,2, Jiaoling Zhao^2、**, Xiaoran Li^2,3、***, Jianda Shao^2,3, Hongjun Zhou⁴, and Tonglin Huo⁴

Author Affiliations

¹School of Physical and Engineering, Tongji University, Shanghai 200092, China

²Laboratory of Thin Film Optics, Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

⁴National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

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References(28)

[1] W. Christian, H. Noreen. Lithography gets extreme. Nat. Photonics, 4, 24(2010).

[2] E. Sharma, R. Rathi, J. Misharwal et al. Evolution in lithography techniques: microlithography. Nanomater., 12, 2754(2022).

[3] M. Kerkhof, F. Liu, M. Meeuwissen et al. High-power EUV lithography: spectral purity and imaging performance. J. Micro/Nanolithogr. MEMS MOEMS, 19, 033801(2020).

[4] M. Ishino, T. H. Dinh, Y. Hosaka et al. Soft x-ray laser beamline for surface processing and damage studies. Appl. Opt., 59, 3692(2020).

[5] D. Wang, H. Yu, Z. Tan et al. Angle measurement of pulsars based on spatially modulated X-ray intensity correlation. Chin. Opt. Lett., 22, 043401(2024).

[6] B. Xu, Z. Chen, T. W. Hänsch et al. Near-ultraviolet photon-counting dual-comb spectroscopy. Nature, 627, 289(2024).

[7] P. G. Bleotu, J. Wheeler, D. Papadopoulos et al. Spectral broadening for multi-Joule pulse compression in the APOLLON long focal area facility. High Power Laser Sci., 10, e9(2022).

[8] N. I. Chkhalo, A. Lopatin, A. Nechay et al. Beryllium-based multilayer mirrors and filters for the extreme ultraviolet range. J Nanosci. Nanotechnol., 19, 546(2019).

[9] N. I. Chkhalo, M. N. Drozdov, S. A. Gusev. Freestanding multilayer films for application as phase retarders and spectral purity filters in the soft x-ray and EUV ranges. Proc. SPIE, 8076, 80760O(2011).

[10] F. R. Powell, T. A. Johnson. Filter windows for EUV lithography. Proc. SPIE, 4343, 585(2001).

[11] N. Lin, Y. Chen, X. Wei et al. Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review. High Power Laser Sci. Eng., 11, e64(2023).

[12] B. L. Henke, E. M. Gullikson, C. D. John. X-ray interactions: photoabsorption, scattering, transmission, and reflection at E= 50–30,000 eV, Z = 1–92. At. Data Nucl. Data Tables, 54, 181(1993).

[13] N. I. Chkhalo, S. A. Gusev, M. N. Drozdov et al. Influence of annealing on the structural and optical properties of thin multilayer EUV filters containing Zr, Mo, and silicides of these metals. Proc. SPIE, 7521, 752105(2010).

[14] P. N. Aruev, M. M. Barysheva, B. Y. Ber et al. Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range. Quantum Electron., 42, 943(2012).

[15] K. Jimenez, P. Nicolosi, L. Juschkin. Extreme ultraviolet freestanding transmittance filters for high brilliance sources, based on Nb/Zr and Zr/Nb thin films on Si3N4 membranes: Design, fabrication, optical and structural characterization. Thin Solid Films, 695, 137739(2020).

[16] M. S. Bibishkin, N. I. Chkhalo, S. A. Gusev et al. Multilayer Zr/Si filters for EUV lithography and for radiation source metrology. Proc. SPIE, 7025, 702502(2008).

[17] W. A. Soer, M. J. J. Jak, A. M. Yakunin et al. Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources. Proc. SPIE, 7271, 72712Y(2009).

[18] S. Y. Zuev, A. Y. Lopatin, V. I. Luchin et al. Comparative study of the thermal stability of be-based extreme ultraviolet pellicles. Tech. Phys., 68, S630(2023).

[19] S. A. Gusev, M. N. Drozdov, E. B. Kluenkov et al. Thermal stability of a freestanding EUV filter under long-term vacuum annealing at 700–1000°C. J. Surf. Investig., 6, 482(2012).

[20] Z. K. Aghkand, E. J. Dil, A. Ajji et al. Simulation of heat transfer in heat sealing of multilayer polymeric films: effect of process parameters and material properties. Ind. Eng. Chem. Res., 57, 14571(2018).

[21] I. Milov, I. A. Makhotkin, R. Sobierajski et al. Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser. Opt. Express, 26, 19665(2018).

[22] S. L. Nyabero, R. W. E. Kruijs, A. E. Yakshin et al. Thermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films. J. Appl. Phys., 112, 054317(2012).

[23] T. Yamauchi, H. Kitamura, N. Wakai et al. Photoelectron spectroscopic studies on interfacial reactions in Zr/2×1(100)Si and Zr/SiO2/(100)Si systems. J. Vac. Sci. Technol. A, 11, 2619(1993).

[24] K. Lalit, D. D. Sarma, S. Krummacher. XPS study of the room temperature surface oxidation of zirconium and its binary alloys with tin, chromium and iron. Appl. Surf. Sci., 32, 309(1988).

[25] N. I. Chkhalo, M. N. Drozdov, S. A. Gusev et al. Investigation of the thermo stability of aluminum thin-film filters with protective MoSi2 cap layers. Appl. Opt., 58, 21(2019).

[26] L. V. Zhigilei, Z. Lin, D. S. Ivanov. Atomistic modeling of short pulse laser ablation of metals connections between melting, spallation, and phase explosion. J. Phys. Chem. C, 113, 11892(2009).

[27] D. Pham, F. Gai, J. Rochester et al. Thermodynamic assessment within the Zr-B-C-O quaternary system. J. Am. Ceram. Soc., 106, 3127(2023).

[28] A. Jain, S. P. Ong, G. Hautier et al. Commentary: the materials project: a materials genome approach to accelerating materials innovation. APL Mater., 1, 011002(2013).

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Jingtao Zhu, Sheng Guo, Jiaoling Zhao, Xiaoran Li, Jianda Shao, Hongjun Zhou, Tonglin Huo, "Component and performance evolution of Zr filters induced by annealing and synchrotron radiation in EUV range," Chin. Opt. Lett. 23, 033401 (2025)

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