NUCLEAR TECHNIQUES, Volume. 45, Issue 11, 110001(2022)

Research status and development trends of irradiation effects on memristor

Yuxiang WANG1, Ge TANG1、*, Yao XIAO1, Xinyu ZHAO1, Peng FENG2, and Wei HU2
Author Affiliations
  • 1College of Nuclear Technology and Automation Engineering, Chengdu University of Technology, Chengdu 610059, China
  • 2College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China
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    Figures & Tables(6)
    Mechanism of filament-type resistive switching
    Mechanism of barrier modulation
    Different radiation damage to memory resistance
    • Table 1. The pre- and post-exposure TaO x state versus dose for different dose rates

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      Table 1. The pre- and post-exposure TaO x state versus dose for different dose rates

      剂量率

      Dose rate / rad(Si)∙s-1

      剂量率辐照暴露前后

      Pre- and post-exposure

      总剂量

      Total ionizing dose / rad(Si)

      器件状态

      Device state

      1×108暴露前Pre-exposure101~104高阻态High-resistance state
      暴露后Post-exposure101~104高阻态High-resistance state
      4×108暴露前Pre-exposure101~103高阻态High-resistance state
      104低阻态Low-resistance state
      暴露后Post-exposure101高阻态High-resistance state
      102~104低阻态Low-resistance state
    • Table 2. Effects of electron irradiation on different types of memristors

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      Table 2. Effects of electron irradiation on different types of memristors

      忆阻器类型

      Memristor type

      电子能量

      Electronic energy

      通量

      Fluence

      结论

      Conclusion

      文献

      References

      TaO x20 MeV5.0×107~4.7×108 rad(Si)∙s-1

      忆阻器功能正常

      Memristor function is normal

      [50, 53]
      TaO x70 keV1.0×105~1.8×107 rad(Si)∙s-1

      忆阻器功能正常

      Memristor function is normal

      [55]
      PdSe20~2 500 mC∙cm-2

      适当辐照可以提高忆阻器的稳定性

      Proper irradiation can improve the stability of memristor

      [56]
      ReS28 000 μC∙cm-2, 6 000 μC∙cm-2, 4 000 μC∙cm-2, 0 μC∙cm-2

      辐照使器件产生S空位,从而具有电阻开关特性

      Irradiation makes the device produce sulfur vacancies, so it has switching characteristics

      [57]
      BaTiO3100 kV7.5×1015 e∙cm-2

      控制辐照可以使铁电薄膜具有忆阻特性

      Controlled electron beam radiation, ferroelectric film of BaTiO3 can be turned into a memristor

      [58]
    • Table 3. Effects of ion irradiation on different types of memristors

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      Table 3. Effects of ion irradiation on different types of memristors

      忆阻器类型

      Memristor type

      离子类型

      Ion type

      能量

      Energy

      通量

      Fluence

      结论

      Conclusion

      文献

      References

      TiO2Bi离子Bi ions941 MeV23 Mrad(Si)

      忆阻器功能正常

      Memristor function is normal

      [37, 39,40, 49, 55]
      Si离子Si ions800 keV0~7.5×1012 ions∙cm-2
      Ta离子Ta ions800 keV109~1014 ions∙cm-2
      Si离子Si ions28 MeV1×107~1×109 rad(Si)
      α 粒子α particle1 MeV1012~1015 ions∙cm-2
      TaO xSi离子Si ions28 MeV1×107~1×109 rad(Si)

      忆阻器功能正常

      Memristor function is normal

      [49, 55]
      Ta离子Ta ions800 keV109~1014 ions∙cm-2
      La2/3Ca1/3MnO3O离子O ions2 MeV2×1014 ions∙cm-2

      忆阻器功能正常

      Memristor function is normal

      [60]
      TiO2

      碳离子射线

      Carbon ion beam

      100 keV

      10 keV

      辐照导致器件中产生氧空穴,当氧离子到达电极,会产生氧气造成忆阻器功能破坏

      Radiation induced appearance of oxygen vacancies, if the displaced oxygen ions

      reach the platinum electrodes, they can form O2 gas and cause permanent disruption of memristor functionality

      [61-62]

      钙钛矿氧化物

      Perovskite oxide memristors

      硼离子束

      B ion beam

      磷离子束

      P ion beam

      氮离子束

      N ion beam

      氖离子束

      Ne ion beam

      碳离子束

      C ion beam

      50 keV

      100 keV

      100 keV

      100 keV

      100 keV

      [63]
      MoO x

      Ar离子

      Ar ions

      离子源

      Ion source

      电压300 V

      Voltage 300 V

      电流10 mA

      Electric current

      10 mA

      4.97×1018 ions·s-1·m-2

      (3 min, 5 min, 10 min)

      辐照后MoO x 忆阻器稳定性提升

      Stability improvement of MoO x memristor after irradiation

      [64]
      WO x

      辐照后WO x 忆阻器的能耗降低

      The energy consumption of WO x memristor is reduced after irradiation

      LiNbO3

      Ar离子

      Ar ions

      100 eV

      离子源KDC40

      Ion source KDC40

      辐照可以改善LiNbO3性能

      Irradiation can improve the properties of LiNbO3 thin films

      [66]
      80 keV[67-68]
      80 eV4.97×1018 ions·s-1·m-2[69]
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    Yuxiang WANG, Ge TANG, Yao XIAO, Xinyu ZHAO, Peng FENG, Wei HU. Research status and development trends of irradiation effects on memristor[J]. NUCLEAR TECHNIQUES, 2022, 45(11): 110001

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    Paper Information

    Category: Research Articles

    Received: Jul. 21, 2022

    Accepted: --

    Published Online: Nov. 25, 2022

    The Author Email: Ge TANG (tangge_cqu@163.com)

    DOI:10.11889/j.0253-3219.2022.hjs.45.110001

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