[3] [3] 3 Guy Davies, Judon Stoeldraijer, Barbra Heskamp et al.. 193 nm Step and Scan Lithography [C]. SEMI Technology Symposium 98, Makuhari Messe, Chiba, Japan. 1～15

[4] [4] 4 Glen P. Callahan, Bruce K. Flint. Characteristics of deep UV optics at 193 nm & 157 nm [C]. SPIE, 1998, 3578:45～53

[5] [5] 5 Philippe Torchio, Alexandre Gatto, Marco Alvisi et al.. High-reflectivity HfO2/SiO2 ultraviolet mirrors [J]. Appl. Opt., 2002, 41(16):3256～3261

[8] [8] 8 J. O. Porteus. Relation between the height distribution of a rough surface and the reflectance at normal incidence [J]. J. Opt. Soc. Am., 1963, 53(12):1394～1402