[1] [1] Liu Xiaofei, Wang Xiaoping, Wang Lijun, et al. Research progress in transparent conducting films［J］. Laser & Optoelectronics Progress, 2012, 49(10): 100003.

[2] [2] Noh S I, Ahn H J, Riu D H. Photovoltaic property dependence of dye-sensitized solar cells on sheet resistance of FTO substrate deposited via spray pyrolysis［J］. Ceramics International, 2012, 38(5): 3739-3739.

[3] [3] Ito S, Murakami T N, Liska P, et al. Fabrication of thin film dye sensitized solar cells with solar to electric power conversion efficiency over 10%［J］. Thin Solid Films, 2008, 516(14): 4613-4619.

[4] [4] Liu H, Avrutin V, Izyumskaya N. Transparent conducting oxides for electrode applications in light emitting and absorbing devices［J］. Superlattices and Microstructures, 2010, 48(5): 458-484.

[5] [5] Chen M, Pei Z L, Sun C, et al. ZAO: An attractive potential substitute for ITO in flat display panels［J］. Materials Science and Engineering B, 2001, 85(2-3): 212-217.

[6] [6] He Xiaoxiao, Wang Wenjun, Li Shuhong, et al. Design and properties analogy of ZnO-based multilayer transparent conducting film［J］. Chinese J Lasers, 2014, 41(6): 0607001.

[7] [7] Hou Shunbao, Hu Ming, Lü Zhijun, et al. Influence of rapid thermal process conditions on electrical and optical properties of VO2 thin film［J］. Chinese J Lasers, 2012, 39(1): 0107002.

[8] [8] Huang Xiangjun, Zhang Yaoju, An Hongchang. Reduction of reflection in amorphous silicon thin film solar cell with double grating structure［J］. Laser & Optoelectronics Progress, 2015, 52(7): 073101.

[9] [9] Park H K, Kang J W, Na S I, et al. Characteristics of indium-free GZO/Ag/GZO and AZO/Ag/AZO multilayer electrode grown by dual target DC sputtering at room temperature for low-cost organic photovoltaics［J］. Solar Energy Materials and Solar Cells, 2009, 93(11): 1994-2002.

[10] [10] Li B J, Huang L J, Ren N F, et al. Titanium dioxide-coated fluorine-doped tin oxide thin films for improving overall photoelectric property［J］. Applied Surface Science, 2014, 290(2): 80-85.

[11] [11] Xu Q, Hong R D, Huang H L, et al. Laser annealing effect on optical and electrical properties of Al doped ZnO films［J］. Optics and Laser Technology, 2013, 45(1): 513-517.

[12] [12] Zhu B, Sun X, Zhao X, et al. The effects of substrate temperature on the structure and properties of ZnO films prepared by pulsed laser deposition［J］. Vacuum, 2008, 82(5): 495-500.

[13] [13] Oane M, Scarlat F, Tsao S L, et al. Thermal fields in laser-multi-layer structures interaction［J］. Optics and Laser Technology, 2007, 39(4): 796-799.

[14] [14] Tseng S F, Hsiao W T, Chiang D, et al. Mechanical and optoelectric properties of post-annealed fluorine-doped tin oxide films by ultraviolet laser irradiation［J］. Applied Surface Science, 2011, 257(16): 7204-7209.

[15] [15] Chen M F, Lin K M, Ho Y S. Effects of laser-induced recovery process on conductive property of SnO2∶F thin films［J］. Materials Science and Engineering B, 2011, 176(2): 127-131.

[16] [16] Huang L J, Ren N F, Li B J, et al. Improvement in overall photoelectric properties of Ag/FTO bilayer thin films using furnace/laser dual annealing［J］. Materials Letters, 2014, 116(2): 405-407.

[17] [17] Huang L J, Ren N F, Li B J, et al. A comparative study of different M (M=Al, Ag, Cu)/FTO bilayer composite films irradiated with nanosecond pulsed laser［J］. Journal of Alloys and Compounds, 2014, 617: 915-920.

[18] [18] Li B J, Huang L J, Ren N F, et al. Improving the performance of nickel-coated fluorine-doped tin oxide thin films by magnetic-field-assisted laser annealing［J］. Applied Surface Science, 2015, 351: 113-118.

[19] [19] Li B J, Zhou M, Ma M, et al. Effects of nanosecond laser irradiation on photoelectric properties of AZO/FTO composite films［J］. Applied Surface Science, 2013, 265(1): 637-641.

[20] [20] Ren N F, Huang L J, Li B J, et al. Laser-assisted preparation and photoelectric properties of grating-structured Pt/FTO thin films［J］. Applied Surface Science, 2014, 314(24): 208-214.

[21] [21] Kim M S, Kim D Y, Cho M Y, et al. Effects of buffer thickness on properties of ZnO thin films grown on porous silicon by plasma-assisted molecular beam epitaxy［J］. Vacuum, 2012, 86(9): 1373-1379.

[22] [22] Nanto H, Minami T, Shooji S, et al. Electrical and optical properties of zinc oxide thin films prepared by RF magnetron sputtering for transparent electrode applications［J］. Journal of Applied Physics, 1984, 55(4): 1029-1034.

[23] [23] Li B J, Huang L J, Ren N F, et al. Two-step preparation of laser-textured Ni/FTO bilayer composite films with high photoelectric properties［J］. Journal of Alloys and Compounds, 2015, 640: 376-382.

[24] [24] Lee C J, Lin H K, Li C H, et al. A study on electric properties for pulse laser annealing of ITO film after wet etching［J］. Thin Solid Films, 2012, 522(522): 330-335.

[25] [25] Lee J W, Hui K N, Hui K S, et al. Low resistivity of Ni-Al co-doped ZnO thin films deposited by DC magnetron sputtering at low sputtering power［J］. Applied Surface Science, 2014, 293: 55-61.

[26] [26] Chaoumead A, Joo B H, Kwak D J, et al. Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering［J］. Applied Surface Science, 2013, 275: 227-232.

[27] [27] Nezar S, Saoula N, Sali S, et al. Properties of TiO2 thin films deposited by RF reactive magnetron sputtering on biased substrates［J］. Applied Surface Science, 2016, 395: 172-179.

[28] [28] Song S M, Yang T L, Li Y H, et al. Structural, electrical, and optical properties of ITO films with a thin TiO2 seed layer prepared by RF magnetron sputtering［J］. Vacuum, 2009, 83(8): 1091-1094.

[29] [29] Kumar B R, Rao T S. Microstructural, electrical and optical properties of DC reactive magnetron sputtered zinc aluminum oxide thin films for optoelectronic devices［J］. Journal of Optoelectronics and Biomedical Materials, 2012, 4(2): 35-42.

[30] [30] Hezam M, Tabet N, Mekki A. Synthesis and characterization of DC magnetron sputtered ZnO thin films under high working pressures［J］. Thin Solid Films, 2010, 518(24): 161-164.

[31] [31] Winfield R J, Koh L H K, Brien S O, et al. Excimer laser processing of ZnO thin films prepared by the sol-gel process［J］. Applied Surface Science, 2007, 254(4): 855-858.

[32] [32] Park S H, Jang S, Lee D J, et al. Two-step flash light sintering process for crack-free inkjet-printed Ag films［J］. Journal of Micromechanics and Microengineering, 2012, 23(1): 15013-15021.

[33] [33] Shanthi E, Dutta V, Banerjee A, et al. Electrical and optical properties of undoped and antimony-doped tin oxide films［J］. Journal of Applied Physics, 1980, 51(12): 6243-6251.

[34] [34] Haacke G. New figure of merit for transparent conductors［J］. Journal of Applied Physics, 1976, 47(9): 4086-4089.

[35] [35] Jun M C, Koh J H. Effects of NIR annealing on the characteristics of Al-doped ZnO thin films prepared by RF sputtering［J］. Nanoscale Research Letters, 2012, 7(1): 294-300.