[1] [1] Masamitsu Haruna, Masanobu Takahashi, Kohji Wakahayashi et al.. Laser beam lithographed micro-Fresnel lenses [J]. Appl. Opt., 1990, 29(34):5120～5126

[2] [2] M. T. Gale, G. K. Lang, J. M. Raynor et al.. Fabrication of kinoform structures for optical computing [J]. Appl. Opt., 1992, 31(26):5712～5715

[3] [3] P. Langlois, H. Jerominek, L. Leclerc et al.. Diffractive optical elements fabricated by laser direct writing and other techniques [C]. SPIE, 1992, 1751:2～12

[4] [4] Ulrich Krackhardt, Johannes Schwider, Martin Schrader et al.. Synthetic holograms written by a laser pattern generator [J]. Opt. Eng., 1993, 32(4):781～785

[5] [5] Gregory P. Behrmann, Michael T. Duignan. Excimer laser micromachining for rapid fabrication of diffractive optical elements [J]. Appl. Opt., 1997, 36(20):4666～4674

[6] [6] Michael R. Wang, Heng Su. Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication [J]. Appl. Opt., 1998, 37(32):7568～7576

[7] [7] Yang Guoguang, Sheng Yibing. Research on laser direct writing system and its lithography properties [C]. SPIE, 1998, 3550:409～418

[8] [8] José Ramón Salgueiro, Juan Félix Román, Vicente Moreno. System for laser writing to lithograph masks for integrated optics [J]. Opt. Eng., 1998, 37(4):1115～1123

[9] [9] Jinglei Du, Fuhua Gao, Yongkang Guo et al.. Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function [J]. Opt. Eng., 2000, 39(3):771～775

[10] [10] John P. Bowen, Robert L. Michaels, C. Gary Blough. Generation of large-diameter diffractive elements with laser pattern generation [J]. Appl. Opt., 1997, 36(34):8970～8975

[11] [11] Alexander G. Poleshchuck, Evgeny G. Churin, Voldemar P. Koronkevich et al.. Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure [J]. Appl. Opt., 1999, 38(8):1295～1301

[12] [12] William Goltsos, Sharlene Liu. Polar coordinate laser writer for binary optics fabrication [C]. SPIE, 1990, 1221:137～147

[13] [13] Yuen-chuen Chan, Yee-Loy Lam, Yan Zhou et al.. Development and applications of a laser writing lithography system for maskless patterning [J]. Opt. Eng., 1998, 37(9):2521～2530

[14] [14] Takashi Nomura, Kazuhide Kamiya, Hiroshi Miyashiro et al.. An instrument for manufacturing zone-plates by using a lathe [J]. Prec. Eng., 1994, 16(4):290～295

[15] [15] Cynthial L. Vernold, Thomas D. Milster. Non-photolithographic fabrication of large computer-generated diffractive optical elements [C]. SPIE, 1994, 2263:125～133

[16] [16] Robert M. O'Connell, Cheng-Hao Chen. Ronchi ruling characterization of axially symmetric laser beams [J]. Appl. Opt., 1990, 29(30):4441～4446

[17] [17] Donald K. Cohen, Blake Little, Frank S. Luecke. Techniques for measuring 1-μm diam Gaussian beams [J]. Appl. Opt., 1984, 23(4):637～640