Near-infrared (NIR) photodetectors[
Journal of Semiconductors, Volume. 46, Issue 4, 042701(2025)
High carrier collection efficiency in graphene/GaAs heterojunction photodetectors
In the rapidly evolving field of modern technology, near-infrared (NIR) photodetectors are extremely crucial for efficient and reliable optical communications. The graphene/GaAs Schottky junction photodetector leverages graphene’s exceptional carrier mobility and broadband absorption, coupled with GaAs’s strong absorption in the NIR spectrum, to achieve high responsivity and rapid response times. Here, we present a NIR photodetector employing a graphene/GaAs Schottky junction tailored for communication wavelengths. We fabricated high-performance graphene/GaAs Schottky junction devices with interdigitated electrodes of varying finger widths, systematically investigating their impact on device performance. The experimental results demonstrate that incorporating interdigitated electrodes significantly enhances the collection efficiency of photogenerated carriers in graphene/GaAs photodetectors. When illuminated by 808 nm NIR light at an intensity of 7.23 mW/cm2, the device achieves an impressive switch ratio of 10?, along with a high responsivity of 40.1 mA/W and a remarkable detectivity of 2.89 × 1013 Jones. Additionally, the device is characterized by rapid response times, with rise and fall times of 18.5 and 17.5 μs, respectively, at a 3 dB bandwidth. These findings underscore the significant potential of high-performance graphene/GaAs photodetectors for applications in NIR optoelectronic systems.
Introduce
Near-infrared (NIR) photodetectors[
Diverse strategies have been investigated to elevate the performance of graphene/GaAs-based photodetectors. Luo et al. notably enhanced a bilayer graphene/GaAs (BLG/GaAs) Schottky junction NIR photodetector through the application of an AlOx surface passivation method, which concurrently improved response time and detection rate[
Herein, we introduce a novel device design that optimizes the graphene/GaAs heterostructure through the utilization of interdigitated electrodes[
Experimental
Device fabrication
Initially, n-type GaAs semiconductor substrates were diced into 1cm × 1cm squares using a Disco dicing saw. The surfaces were then treated to remove surface oxides with a cleaning solution consisting of acetone, isopropanol, and 5% hydrochloric acid. Subsequently, a 10 nm thick layer of chromium and a 90 nm thick layer of gold were deposited on the back of the substrates via magnetron sputtering, serving as electrodes. Following this, the graphene was then transferred to the device substrate through a wet transfer technique.
Subsequently, patterns for interdigitated electrodes with different finger widths were fabricated utilizing standard photolithographic processes, including spin-coating resist, exposing the pattern, and developing the resist. The transferred graphene was then coated with a 10/90 nm bilayer of Cr/Au through sputtering.
Graphene patterning was achieved through photolithography, followed by etching with an oxygen plasma etcher. The optimal etching parameters were ascertained through numerous trials, resulting in a power of 100 W, an etching time of 180 s, and an O2 flow rate of 200 standard cubic centimeters per minute. It was observed that excessive power or prolonged etching times could lead to degradation of the photoresist or its residues on the graphene film. For comparative analysis, the same fabrication processes without interdigitated structures were also performed.
Characterization and measurement
A Keithley 4200A-SCS system, which is designed for semiconductor characterization, was employed to assess the I−V characteristics and I−T responses of the photodetectors. The optical power density of an 808 nm light source (TTT-PC-Laser-NSC) was quantified using a digital handheld optical power meter (PM100) in conjunction with a photodiode power sensor (S122C). To analyze the current noise density spectrum (SID) of the photodetectors, measurements were conducted using a low-noise test system (LFN-2000). All measurements were performed in ambient air without any device encapsulation.
Results and discussion
Figure 1.(Color online) (a) 3D structure diagram of the graphene/GaAs heterostructure device with interdigitated electrodes. (b) SEM images of graphene/GaAs heterojunction photodetectors with interdigitated electrodes. (c) Raman spectrum of graphene. (d) Graphene/GaAs energy band diagram under illumination.
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Under dark conditions and 808 nm laser illumination, the I−V response of a graphene/GaAs heterojunction photodetector with interdigitated electrodes is shown in
Figure 2.(Color online) (a) The I−V curves of GaAs/graphene devices with interdigitated electrodes and standard graphene/GaAs devices under dark conditions and 808 nm illumination (insert: the schematic diagram of standard graphene/GaAs devices). (b) Momentary photoresponse features under 808 nm illumination conditions at zero bias. (c) I−V characteristics of graphene/GaAs heterojunction detectors with interdigitated electrodes of varying widths under dark conditions and 808 nm illumination. (d) I−V characteristics of graphene/GaAs heterojunction detectors with interdigitated electrodes of varying widths under dark conditions and 1064 nm illumination.
Under 808 nm illumination (7.23 mW/cm2), both devices exhibit a sharp increase in reverse current. Furthermore, the photovoltaic effect was remarkable in the graphene/GaAs heterojunction device with interdigitated electrodes. It shows an open-circuit voltage (VOC) of 0.79 V and a short-circuit current (ISC) of 253.3 μA, which were higher than those of the planar electrode device (0.69 V, 10.5 μA). The larger photo−dark switching ratio observed in the device with interdigitated electrodes can be ascribed to the increased effective illuminated area, which considerably enhances the generation and collection of photogenerated carriers. Despite the reduced rectification ratio, the recombination and trapping effects are less pronounced, contributing to the higher switching ratio.
Interface defects affect carrier recombination, potentially leading to an increase in effective carriers under illumination, further enhancing the switching ratio. The prominent photovoltaic properties allow the heterojunction device to detect light under zero bias voltage, eliminating the need for external power consumption. The time-resolved photovoltaic response of these two devices under 808 nm illumination is presented in
The photodetection performance of the graphene/GaAs heterojunction with interdigitated electrodes strongly depends on light intensity. As light intensity rises from 1.55 μW/cm2 to 7.23 mW/cm2, both ISC and VOC increase together. The device reaches maximum values of 2.12 × 10−4 A and 0.79 V at 7.23 mW/cm2, as shown in the I−V curves in
Figure 3.(Color online) (a) I−V and (b) I−T characteristics of the graphene/GaAs heterojunction device with interdigitated electrodes under different light intensities at 808 nm illumination. (c) Biaxial logarithmic depiction of photoelectric current against light intensity. (d) Responsivity and computed specific detectivity for the device versus light intensity. (e) I−V characteristics and (f) I−T characteristics of the graphene/GaAs heterojunction device with interdigitated electrodes under varying light intensities at 1064 nm illumination.
where Il and Id represent the photocurrent and dark current, Pλ is the incident light power, A represent the active device area, and e represents the elementary charge, respectively[
Next, the photoresponse characteristics of the graphene/GaAs heterojunction photodetector with interdigitated electrodes were further assessed at a wavelength of 1064 nm.
Response speed is important for photodetectors, as it defines their capability to identify pulsed light signals. This capability is essential for high-speed imaging and detection, biomedical applications, and security and surveillance systems. The frequency response of the graphene/GaAs heterojunction photodetector with interdigitated electrodes was assessed by adjusting the frequency of pulsed laser illumination.
Figure 4.(Color online) Frequency response of the graphene/GaAs heterojunction photodetector with interdigitated electrodes to 808 nm light at (a) 2 kHz and (b) 9581 Hz. (c) The 3 dB bandwidth of the graphene/GaAs heterojunction detector with interdigitated electrodes. (d) The device’s dynamic rise and fall characteristics under 9581 Hz pulsed light.
Conclusion
In summary, we have successfully created a self-propelled, high-efficiency graphene/GaAs heterojunction photodetector featuring interdigitated electrodes. The Type Ⅱ heterojunction expands its detection range to 1064 nm and ensures high sensitivity. The finger electrode structure shortens the path of photo-generated carriers to the electrodes, reducing series resistance. This design effectively captures photo-generated carriers, minimizes recombination, and increases collection efficiency. Additionally, the larger contact area between light and the detector material improves light absorption and enhances the efficiency of charge separation. This process is further accelerated by the presence of the heterojunction. As a consequence, the graphene/GaAs heterojunction photodetector with interdigitated electrodes exhibits a remarkable responsivity of 40.1 mA/W, superior detectivity reaching up to 2.9 × 10¹³ Jones, rapid response times of 18.5/17.5 µs, and a high switching ratio of up to 10⁷. These metrics surpass most graphene/GaAs heterojunction-based photodetectors. This work provides a novel strategy for designing high-performance NIR photodetectors, demonstrating significant potential for infrared detection and imaging applications.
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Baorui Fang, Ye Tian, Zongmin Ma. High carrier collection efficiency in graphene/GaAs heterojunction photodetectors[J]. Journal of Semiconductors, 2025, 46(4): 042701
Category: Research Articles
Received: Nov. 3, 2024
Accepted: --
Published Online: May. 21, 2025
The Author Email: Ye Tian (YTian), Zongmin Ma (ZMMa)