Chinese Journal of Lasers, Volume. 35, Issue 3, 436(2008)

Process Investigation of a-Si:H Thin Films Prepared by Direct Current Magnetron Sputtering and Application on Diode Laser Cavity Coatings

Liu Chunling1,2、*, Yao Yanping1, Wang Chunwu2, Wang Yuxia1, and Bo Baoxue1
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  • 2[in Chinese]
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    References(4)

    [2] [2] Maruf Hossain, Husam H. Abu-Safe, Hameed Naseem et al.. Characterization of hydrogenated amorphous silicon thin films prepared by magnetron sputtering [J]. Non-Crystalline Solids, 2006, 352:18~23

    [5] [5] Peter Unger, Edeltraud Gehrig, Ortwin Hess et al.. High-Power Diode Lasers-Fundamentals, Technology, Applications [M]. Beilin: Springer-Verlag Berlin Heidelberg, 2000. 34~37

    [10] [10] N. Saito, H. Sannomiya, T. Yamaguchi et al.. Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas [J]. Appl. Phys.A, 1984, 35:241~247

    [12] [12] Yi Qu, Shu Yuan, Chong Yanglin et al.. High power InAIGaAs/GaAs and AIGaAs/GaAs semiconductor laser arrays emitting at 808 nm [J]. IEEE Photon. Technol. Lett., 2004, 16(2):389~391

    CLP Journals

    [1] Liu Chunling, Wang Chunwu, Wang Guangde, Qiao Zhongliang, Jiang Wenlong, Yao Yanping, Chen Wanjin. Process Investigation of H4 Thin Film Prepared by Electron Beam Evaporation and Application on Laser Diodes Cavity Coatings[J]. Chinese Journal of Lasers, 2010, 37(12): 3140

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    Liu Chunling, Yao Yanping, Wang Chunwu, Wang Yuxia, Bo Baoxue. Process Investigation of a-Si:H Thin Films Prepared by Direct Current Magnetron Sputtering and Application on Diode Laser Cavity Coatings[J]. Chinese Journal of Lasers, 2008, 35(3): 436

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    Paper Information

    Category: materials and thin films

    Received: May. 14, 2007

    Accepted: --

    Published Online: Mar. 24, 2008

    The Author Email: Chunling Liu (lclwcw@yahoo.com.cn)

    DOI:

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