Optoelectronic Technology, Volume. 42, Issue 3, 176(2022)

Fabrication and Performance Optimization of Full-color QLED Devices Based on Photolithography

Hongjin GAO, Jipeng JING, Fushan LI, and Hailong HU
Author Affiliations
  • College of Physics and Information Engineering, Fuzhou University, Fuzhou 350108,CHN
  • show less
    Figures & Tables(6)
    Illustration schematic of the fabrication procedure of full-color QD films
    Fluorescence micrographs of sequentially deposited blue, green and red quantum dot subpixels
    Device performance of full-color QLEDs
    Electrical performance of QLEDs after EDT-passivation
    Electrical performance of QLEDs with a PMMA charge blocking layer
    Electron luminescence images of full-color QLED device and microscope image of pixels
    Tools

    Get Citation

    Copy Citation Text

    Hongjin GAO, Jipeng JING, Fushan LI, Hailong HU. Fabrication and Performance Optimization of Full-color QLED Devices Based on Photolithography[J]. Optoelectronic Technology, 2022, 42(3): 176

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Research and Trial-manufacture

    Received: Mar. 4, 2022

    Accepted: --

    Published Online: Dec. 23, 2022

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2022.03.004

    Topics