Acta Optica Sinica, Volume. 33, Issue 5, 505001(2013)
Exposure Developing Simulation Study of Single-Mode-Resonance Interference Lithography
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Yang Zheng, Zhang Zhiyou, Li Shuhong, Gao Fuhua, Du Jinglei. Exposure Developing Simulation Study of Single-Mode-Resonance Interference Lithography[J]. Acta Optica Sinica, 2013, 33(5): 505001
Paper Information
Category: Diffraction and Gratings
Received: Dec. 20, 2012
Accepted: --
Published Online: Mar. 22, 2013
The Author Email: Zheng Yang (cqyangking@163.com)
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