Laser & Optoelectronics Progress, Volume. 57, Issue 1, 011201(2020)

Line Spacing Measurement Method Based on Image Processing

Xiaodong Zhang*, Lin Zhao, Zhiguo Han, Yanan Feng, and Suoyin Li
Author Affiliations
  • The 13th Institute of China Electronics Technology Corporation, Shijiazhuang, Hebei 050051, China
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    Figures & Tables(8)
    Standard line spacing sample with micro-nano size
    CD-SEM measurement system
    Sample obtained by CD-SEM
    Oblique detection method
    Baseline detection method
    NMM system
    • Table 1. Measurement values of two algorithms

      View table

      Table 1. Measurement values of two algorithms

      Nominalvalue /μmLinear approximationalgorithm /μmLine spacingmeasurementalgorithm /μm
      0.10.09890.0990
      0.20.19890.1991
      0.50.49770.4987
      10.99991.0005
      22.00222.0009
      55.00415.0038
      109.95369.9736
    • Table 2. Comparison of measurement results of two algorithms

      View table

      Table 2. Comparison of measurement results of two algorithms

      Nominalvalue /μmMeasurementof NMM /μmRelative error of linearapproximation algorithm /%Relative error of line spacingmeasurement algorithm /%
      0.10.09930.4030.302
      0.20.19960.3510.251
      0.50.49980.4200.220
      110.0100.050
      220.1100.045
      55.0030.0220.016
      109.9990.4540.254
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    Xiaodong Zhang, Lin Zhao, Zhiguo Han, Yanan Feng, Suoyin Li. Line Spacing Measurement Method Based on Image Processing[J]. Laser & Optoelectronics Progress, 2020, 57(1): 011201

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: May. 13, 2019

    Accepted: Jun. 24, 2019

    Published Online: Jan. 3, 2020

    The Author Email: Zhang Xiaodong (zxd_tju_edu@163.com)

    DOI:10.3788/LOP57.011201

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