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Acta Optica Sinica, Volume. 37, Issue 4, 412003(2017)

High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens

Zhu Boer1,2、*, Wang Xiangzhao1,2, Li Sikun1,2, Meng Zejiang1,2, Zhang Heng1,2, Dai Fengzhao1,2, and Duan Lifeng3
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  • 1[in Chinese]
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  • 3[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Zhu Boer, Wang Xiangzhao, Li Sikun, Meng Zejiang, Zhang Heng, Dai Fengzhao, Duan Lifeng. High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens[J]. Acta Optica Sinica, 2017, 37(4): 412003

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Oct. 27, 2016

    Accepted: --

    Published Online: Apr. 10, 2017

    The Author Email: Boer Zhu (zhuboer@126.com)

    DOI:10.3788/aos201737.0412003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology