Journal of Synthetic Crystals, Volume. 54, Issue 6, 997(2025)

Growth of LiGa5O8 Single Crystal Thin Films and Their Conductive Mechanism by the Mist-CVD Method

Hao ZHAO, Bowen YU, Qi LI, Guangqing LI, Yiyuan LIU, Na LIN, Yang LI, Wenxiang MU, and Zhitai JIA*
Author Affiliations
  • The Institute of Novel Semiconductors, State Key Laboratory of Crystal Materials, Shandong University, Jinan250100, China
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    Figures & Tables(7)
    XRD pattern of the LiGa5O8 thin film grown on c-Al2O3 substrate
    SEM and AFM images of the LiGa5O8 thin film
    Ultraviolet and infrared spectra of the LiGa5O8 thin film. (a) Ultraviolet transmittance spectrum; (b) ultraviolet Tauc plot; (c) infrared transmittance spectrum
    XPS of the LiGa5O8 thin film
    Photodetector performance of the LiGa5O8 thin film (n(Li)∶n(Ga) = 0.21). (a) Structure of the photodetector device; (b) I-V curves of dark and photocurrent under 254 nm illumination; (c) I-t curve of photoresponse time at a 10 V bias
    Calculated band structures of intrinsic Li and Ga substitution defects in LiGa5O8. (a) Band structure of a perfect LiGa5O8 lattice, solid line represents PBE calculation, dotted line represents GW calculation; (b) band structure with GaLi defects, n(Li)∶n(Ga)=0.185; (c) band structure with LiGa(8) defects, where Li substitutes 8-coordinated Ga, n(Li)∶n(Ga)=0.215;(d) band structure with LiGa(4) defects, where Li substitutes 4-coordinated Ga, n(Li)∶n(Ga)=0.215
    Formation energies of GaLi and LiGa defects in LiGa5O8 (solid line represents the formation energy of GaLi defects, dotted line represents the formation energy of LiGa defects)
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    Hao ZHAO, Bowen YU, Qi LI, Guangqing LI, Yiyuan LIU, Na LIN, Yang LI, Wenxiang MU, Zhitai JIA. Growth of LiGa5O8 Single Crystal Thin Films and Their Conductive Mechanism by the Mist-CVD Method[J]. Journal of Synthetic Crystals, 2025, 54(6): 997

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    Paper Information

    Category:

    Received: Jan. 6, 2025

    Accepted: --

    Published Online: Jul. 8, 2025

    The Author Email: Zhitai JIA (z.jia@sdu.edu.cn)

    DOI:10.16553/j.cnki.issn1000-985x.2025.0002

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