Laser & Optoelectronics Progress, Volume. 62, Issue 13, 1300016(2025)

Oxidation Resistance of Laser Cladding Alloys at High Temperature

Haoqiang Zhang*, Zengyu Wu, Lina Wang, Zhanshan Ma, and Suoxia Hou
Author Affiliations
  • College of Mechanical Engineering, North China University of Science and Technology, Tangshan 063210, Hebei , China
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    Figures & Tables(13)
    Oxide film thickness on TC4 substrate and coating cross-section with different SiC contents[27]. (a) TC4 substrate; (b) Ti-Al; (c) 99.4%(Ti-Al)+0.6%SiC; (d) 98.8%(Ti-Al)+1.2%SiC
    Average grain size and KAM value of the HEA coatings[10]
    Oxidation kinetic curves of the alloy coatings with different Cr contents during being oxidized at 500 ℃ for 100 h[36]. (a) Mass gain curves; (b) fitted lines of square mass gain
    Oxidation kinetics curves of various alloys under isothermal cycling at 800 ℃[40]
    Schematic diagram of oxidation mechanism[41]
    Element distribution maps of Y2O3/CoCrFeNiTiNb coating after oxidation at 800 ℃ for 50 h[46]
    Micro-channel model of the oxide film on the surface of the coating[51]. (a) Without nano-CeO2; (b) with nano-CeO2
    Photographical surface of three samples after high temperature oxidation at 600 ℃ and 900 ℃[55]
    Schematic diagram of the coating micromorphology before and after HCPEB irradiation[60]
    Effect of ultrasonic vibration power on dendrite morphology and the size and distribution of ceramic phases in the coatings[67]. (a) Dendrite morphology without ultrasonic vibration assistance; (b) dendrite morphology with 300 W ultrasonic vibration assistance; (c) size and distribution of ceramic phases without ultrasonic vibration assistance; (d) size and distribution of ceramic phases with 300 W ultrasonic vibration assistance
    Surface images of Co-based coating after high-temperature oxidation at 650 ℃[69]. (a) Without field assistance; (b) with ultrasonic filed assistance; (c) with magnetic field assistance; (d) with magnetic and ultrasonic fields assistance
    • Table 1. PBR and melting point of common oxides[15-18]

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      Table 1. PBR and melting point of common oxides[15-18]

      OxidePBRMelting point /℃
      TiO21.761830
      Nb2O51.981460
      Cr2O32.022435
      MoO32.74795
      Al2O31.282015
      Ta2O52.731785
      ZrO21.571205
      SiO21.881713
    • Table 2. Characteristics of oxides and oxidation films of Cr, Al, Si, and Ti elements[19-20]

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      Table 2. Characteristics of oxides and oxidation films of Cr, Al, Si, and Ti elements[19-20]

      ElementOxideGibbs free energy at 1000 K /(kJ/mol)Thermal expansion coefficient /K-1Characteristics of oxide film
      SiSiO2-730.304

      Amorphous state: 0.5×10-6

      Crystalline state: 5.0×10-6

      Dense and fluid at high temperature
      AlAl2O3-1361.0237.4×10-6 to 8.6×10-6Dense and good thermal stability
      CrCr2O3-871.3367.3×10-6 to 9.6×10-6Dense and good thermal stability, but poor plasticity, prone to cracking and peeling
      TiTiO2-762.6827.14×10-6 to 9.19×10-6Loose and porous, with poor antioxidant capacity
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    Haoqiang Zhang, Zengyu Wu, Lina Wang, Zhanshan Ma, Suoxia Hou. Oxidation Resistance of Laser Cladding Alloys at High Temperature[J]. Laser & Optoelectronics Progress, 2025, 62(13): 1300016

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    Paper Information

    Category: Reviews

    Received: Dec. 19, 2024

    Accepted: Feb. 4, 2025

    Published Online: Jun. 10, 2025

    The Author Email: Haoqiang Zhang (haoqiang790914@163.com)

    DOI:10.3788/LOP242447

    CSTR:32186.14.LOP242447

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