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Acta Optica Sinica, Volume. 34, Issue 10, 1022004(2014)

Source Optimization Method of Lithography Tools Based on Quadratic Programming

Yan Guanyong1,2、*, Li Sikun1, and Wang Xiangzhao1,2
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  • 1[in Chinese]
  • 2[in Chinese]
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    Article index updated: Sep. 6, 2025

    The article is cited by 8 article(s) CLP online library. (Some content might be in Chinese.)
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    Yan Guanyong, Li Sikun, Wang Xiangzhao. Source Optimization Method of Lithography Tools Based on Quadratic Programming[J]. Acta Optica Sinica, 2014, 34(10): 1022004

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Apr. 22, 2014

    Accepted: --

    Published Online: Sep. 9, 2014

    The Author Email: Yan Guanyong (ygy9911@163.com)

    DOI:10.3788/aos201434.1022004

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology