Infrared and Laser Engineering, Volume. 44, Issue 10, 3010(2015)
Design and calculation of absorption layer thickness on InP/InGaAs transferred-electron photocathode
The electonic structure and optical properties of standard InGaAs material, which formed the absorption layer of transferred-electron InP/InGaAs photocathode, were studied based on the density functional theory, the exchange and correlation potential energy was described by Heyd-Scuseria-Ernzerh(HSE06). First, the energy band structure of zinc blende GaAs was verified with this hybrid density functional, then the standard InGaAs bulk model was established, and dynamically optimized by self-consistent method before complex dielectric function was obtained, then the optical absorption coefficient was derivated from Kramers-Kronig relation. Finally, under the estimation of P-type standard InGaAs unequilibrium minority carriers effusion length were 0.8, 1.0, 1.2, 1.4, 1.6 and 2.0 m separately, combined with quantum efficiency formula of transferred-electron photocathode, the optimized absorption layer thickness of InP/InGaAs photocathode was derivated according to the photon energy between 0.780 260 eV and 0.820 273 eV with spacing 0.002 eV.
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Ren Bin, Shi Feng, Guo Hui, Jiao Gangcheng, Hu Canglu, Cheng Wei, Xu Xiaobing, Wang Shufei. Design and calculation of absorption layer thickness on InP/InGaAs transferred-electron photocathode[J]. Infrared and Laser Engineering, 2015, 44(10): 3010
Category: 光电器件与材料
Received: Feb. 11, 2015
Accepted: Mar. 3, 2015
Published Online: Jan. 26, 2016
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CSTR:32186.14.