Organic-inorganic hybrid Photosensitive SiO2-TiO2 materials were synthesized by a sol-gel process. The hybrid films were deposited on silica glass substrates and silicon wafers by spin-coating. After the process of prebaking, UV-light exposure and postbaking, the films with the same patterning of mask were obtained. The Optical transmittance and absorption of hybrid films were measured with a ultraviolet-visible-near infrared spectrometer. Their infrared spectra of films at different UV irradiation time were measured with Fourier infrared spectrometer. The surface micro-structures prepared were observed by optical microscopy with a high-resolution CCD camera and Scanning Electron Microscope (SEM). The results show that light transmittances of the hybrid films are nearly 90% in the visible and near infrared range and UV curing has an effect of producing the photopolymerization of methacrylate species. Being prebaked at 80℃ and irradiated with UV light for 15 minutes are very crucial to get clear and precise patterns.