Journal of Infrared and Millimeter Waves, Volume. 40, Issue 3, 329(2021)

RF power performance improvement of multi-finger power bipolar transistor by non-uniform emitter finger spacing design without the use of emitter ballasting resistor

Zheng ZHANG, Yan-Hua ZHANG*, Dong-Yue JIN, Wei-Cong NA, and Hong-Yun XIE
Author Affiliations
  • Faculty of Information Technology, Beijing University of Technology, Beijing 100124, China
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    Figures & Tables(11)
    The measured emitter-base junction voltage VBE as a function of T under different emitter currents of 3 mA, 1 mA, 100 µA and 10 µA respectively
    The schematic diagram of an N-finger HBT, where REi is the emitter ballasting resistor of the ith emitter finger[8-9]
    The schematic-cross section of a cell in multi-finger HBTs
    Micrographs of the fabricated multi-fingers SiGe HBTs with emitter ballasting resistor.(Note: polysilicon emitter ballasting resistors locate at root terminal of each emitter finger, see the enlarged image)
    Micrograph of the fabricated multi-fingers SiGe HBTs with non-uniform finger spacing
    Measured surface temperature distribution by US QFI Infrared TMS for (a) a multi-finger power HBT with emitter ballasting resistor, and (b)for a multi-finger power HBT with non-uniform finger spacing under IC=800 mA, VCE=5 V and case temperature of TC=80 ℃
    The block diagram of RF power measurement system
    RF Output power poutversus RF input power pin for two types of multi-fingers power HBTs with emitter ballasting resistor and with non-uniform emitter finger spacing respectively
    Collector efficiency ηCversus RF input power pin for two types of multi-fingers power HBTs with emitter ballasting resistor and with non-uniform emitter finger spacing respectively.
    Power-added-efficiency(PAE) versus RF input power pin for two types of multi-fingers power HBTs with emitter ballasting resistor and with non-uniform emitter finger spacing respectively
    • Table 1. The material parameters of various layers for SiGe HBTs.

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      Table 1. The material parameters of various layers for SiGe HBTs.

      compositionThickness/nmDoping concentration/cm-3
      EmitterSi121×1018
      BaseSi0.84Ge0.16302×1019
      CollectorSi4.4×1031×1016
      SubstrateSi1.5×1051×1019
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    Zheng ZHANG, Yan-Hua ZHANG, Dong-Yue JIN, Wei-Cong NA, Hong-Yun XIE. RF power performance improvement of multi-finger power bipolar transistor by non-uniform emitter finger spacing design without the use of emitter ballasting resistor[J]. Journal of Infrared and Millimeter Waves, 2021, 40(3): 329

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    Paper Information

    Category: Research Articles

    Received: Jun. 20, 2020

    Accepted: --

    Published Online: Sep. 9, 2021

    The Author Email: Yan-Hua ZHANG (zhangyh@bjut.edu.cn)

    DOI:10.11972/j.issn.1001-9014.2021.03.008

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