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Opto-Electronic Engineering, Volume. 31, Issue 1, 1(2004)

Phase-shifting mask for 100nm node ArF excimer laser lithography

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
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  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Phase-shifting mask for 100nm node ArF excimer laser lithography[J]. Opto-Electronic Engineering, 2004, 31(1): 1

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    Received: Sep. 8, 2003

    Accepted: --

    Published Online: Nov. 14, 2007

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology