Chinese Journal of Lasers, Volume. 12, Issue 9, 532(1985)

Gain measurements of pulsed avalanche discharge XeCl laser by means of amplified spontaneous emission

Lou Qihong
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  • [in Chinese]
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    References(6)

    [1] [1] L. F. Champagne et al.; Appl. Phys. Lett., 1979, 34, No. 5, 315.

    [2] [2] R. S. Taylor et al., Opt. Commun., 1979, 31, No. 2, 197.

    [4] [4] F. K. Tittle et al.; IEEE J. Quant. Electr., 1981, QE-17, No. 12, 2268.

    [5] [5] G. Marowsky et al.; Appl. Phys., 1980, 19, 138.

    [6] [6] Q. H. Lou et al., Appl. Phys. Lett., 1982, 41, No. 6, 514.

    [7] [7] W. T. Silvvast et al.; Appl. Phys. Lett., 1967, 11, 94.

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    Lou Qihong. Gain measurements of pulsed avalanche discharge XeCl laser by means of amplified spontaneous emission[J]. Chinese Journal of Lasers, 1985, 12(9): 532

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    Paper Information

    Category: laser devices and laser physics

    Received: Sep. 25, 1984

    Accepted: --

    Published Online: Nov. 6, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

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