A 5.32 mJ and 47.5 kW cavity-dumped Pr<sup>3+</sup>:LiYF<sub>4</sub> pulsed laser at 639 nm

Wei Yuan; Shaoqiang Zheng; Zheng Zhang; Yongkang Yao; Huiying Xu; Zhiping Cai

doi:10.1017/hpl.2025.1

High Power Laser Science and Engineering, Volume. 13, Issue 2, 02000e18(2025)

A 5.32 mJ and 47.5 kW cavity-dumped Pr³⁺:LiYF₄ pulsed laser at 639 nm

Wei Yuan1...2,3, Shaoqiang Zheng2,3, Zheng Zhang2,3, Yongkang Yao2,3, Huiying Xu2,3, and Zhiping Cai23,* |Show fewer author(s)

Author Affiliations

¹Center for Modern Educational Technology, Guizhou Normal University, Guiyang, China

²School of Electronic Science and Engineering, Xiamen University, Xiamen, China

³Fujian Key Laboratory of Ultrafast Laser Technology and Applications, Xiamen University, Xiamen, China

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CLP Journals

[1] J. Jarrett, M. King, R. J. Gray, N. Neumann, L. Döhl, C. D. Baird, T. Ebert, M. Hesse, A. Tebartz, D. R. Rusby, N. C. Woolsey, D. Neely, M. Roth, P. McKenna. Reflection of intense laser light from microstructured targets as a potential diagnostic of laser focus and plasma temperature[J]. High Power Laser Science and Engineering, 2019, 7(1): 010000e2

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Wei Yuan, Shaoqiang Zheng, Zheng Zhang, Yongkang Yao, Huiying Xu, Zhiping Cai. A 5.32 mJ and 47.5 kW cavity-dumped Pr³⁺:LiYF₄ pulsed laser at 639 nm[J]. High Power Laser Science and Engineering, 2025, 13(2): 02000e18

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