Chinese Optics Letters, Volume. 16, Issue 10, 102401(2018)
Optical rectification in surface layers of germanium
Fig. 1. Ge samples and the measurement setup of EFI OR. (a) The Ge(001) samples; (b) the Ge(110) samples; (c) the Ge(111) samples; (d) the metal–semiconductor–metal configuration of Ge samples; (e) the measurement system for EFI OR.
Fig. 2. EFI OR signals versus the polarization azimuth of the probing beam in the (a) Ge(001), (b) Ge(110), and (c) Ge(111) surface layers.
Fig. 3. Distribution of the normalized EFI OR signals along the normal direction of the Ge crystal. (a) Along the 001 direction for the Ge(001) samples. (b) Along the 110 direction for the Ge(110) samples.
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Li Zhang, Fangye Li, Shuai Wang, Qi Wang, Kairan Luan, Xi Chen, Xiuhuan Liu, Lingying Qiu, Zhanguo Chen, Jihong Zhao, Lixin Hou, Yanjun Gao, Gang Jia, "Optical rectification in surface layers of germanium," Chin. Opt. Lett. 16, 102401 (2018)
Category: Optics at Surfaces
Received: Jul. 5, 2018
Accepted: Aug. 17, 2018
Published Online: Oct. 12, 2018
The Author Email: Zhanguo Chen (czg@jlu.edu.cn)