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Acta Optica Sinica, Volume. 33, Issue 11, 1122002(2013)

Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei

[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei[J]. Acta Optica Sinica, 2013, 33(11): 1122002

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    Paper Information

    Category: Optical Design and Fabrication

    Received: May. 31, 2013

    Accepted: --

    Published Online: Sep. 17, 2013

    The Author Email: (lhmhit@yeah.net)

    DOI:10.3788/aos201333.1122002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology