Chinese Optics Letters, Volume. 5, Issue 10, 602(2007)
Quantum simulation for peak broadening in atom lithography
References(14)
[1] [1] G. L. Timp, R. E. Behringer, D. M. Tennant, J. E. Cunningham, M. Prentiss, and K. K. Berggren, Phys. Rev. Lett. 69, 1636 (1992).
[2] [2] J. J. McClelland, R. E. Scholten, E. C. Palm, and R. J. Celotta, Science 262, 877 (1993).
[3] [3] R. W. McGowan, D. M. Giltner, and S. A. Lee, Opt. Lett. 20, 2535 (1995).
[4] [4] F. Lison, H.-J. Adams, D. Haubrich, M. Kreis, S. Nowak, and K. Meschede, Appl. Phys. B 65, 419 (1997).
[5] [5] K. S. Johnson, J. H. Thywissen, N. H. Dekker, K. K. Berggren, A. P. Chu, R. Younkin, and M. Prentiss, Science 280, 1583 (1998).
[6] [6] P. Engels, S. Salewski, H. Levsen, K. Sengstock, and W. Ertmer, Appl. Phys. B 69, 407 (1999).
[7] [7] J. J. McClelland, J. Opt. Soc. Am. B 12, 1761 (1995).
[9] [9] B. Ma, Y. Ma, M. Zhao, S. Ma, and Z. Wang, Acta Phys. Sin. (in Chinese) 55, 667 (2006).
[10] [10] C. J. Lee, Phys. Rev. A 61, 063604 (2000).
[11] [11] W. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes in C (Cambridge University Press, Cambridge, 1992) p.853.
[12] [12] K. K. Berggren, M. Prentiss, G. L. Timp, and R. E. Behringer, J. Opt. Soc. Am. B 11, 1166 (1994).
[13] [13] W. Cai, C. Li, Y. Huo, and Y. Wang, Acta Phys. Sin. (in Chinese) 48, 611 (1999).
[14] [14] R. J. Celotta, R. Gupta, R. E. Scholten, and J. J. McClelland, J. Appl. Phys. 79, 6079 (1996).
CLP Journals
Tools
Get Citation
Copy Citation Text
Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li, "Quantum simulation for peak broadening in atom lithography," Chin. Opt. Lett. 5, 602 (2007)
Paper Information
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20