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Acta Optica Sinica, Volume. 26, Issue 3, 403(2006)

High Performance Optimization Algorithm for Determining Wafer Exposure Field Layout

[in Chinese]1,2、* and [in Chinese]1
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    [in Chinese], [in Chinese]. High Performance Optimization Algorithm for Determining Wafer Exposure Field Layout[J]. Acta Optica Sinica, 2006, 26(3): 403

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Mar. 23, 2005

    Accepted: --

    Published Online: Apr. 20, 2006

    The Author Email: (hele0511@siom.ac.cn)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology