[1] [1] Dinelli G, Civitano L, Rea M. IEEE Trans. Ind. Appl., 1990, 26(3): 535.

[2] [2] Lowke J J, Morrow R. IEEE Trans. Plasma Sci., 1995, 23(4): 661.

[3] [3] Xu F, Luo Z Y, Cao W, et al. J. Environ. Sci., 2009, 21: 328.

[4] [4] McAdams R. J. Phys. D: Appl. Phys., 2001, 34: 2810.

[5] [5] Gallimberti I, Hepworth J K, Klewe R C. J. Phys. D: Appl. Phys., 1974, 4: 880.

[6] [6] Spyrou N, Manassis C. J. Phys. D: Appl. Phys., 1989, 22: 120.

[7] [7] van Veldhuizen E M, Rutgers W R. J. Phys. D: Appl. Phys., 2002, 35: 2169.

[8] [8] Kim Y, Hong S H, Cha M S, et al. J. Adv. Oxid. Technol., 2003, 6(1): 17.

[9] [9] Nassar H, Pellerin S, Musiol K, et al. J. Phys. D: Appl. Phys., 2004, 37: 1904.

[10] [10] Morgan W L, Penetrante B M. Comp. Phys. Comm., 1990, 58: 127.

[11] [11] Zubek M. J. Phys. B: At. Mol. Opt. Phys., 1994, 27: 573.

[12] [12] McConkey J W, Woolsey J M, Burns D. J. Planet. Space Sci., 1967, 15(8): 1332.

[13] [13] Mok Y S, Nam I S. Chem. Eng. J., 2002, 85: 87.

[14] [14] Yan K, van Heesch E J M, Pemen A J M, et al. J. Plasma Chem. Plasma Process., 2001, 21: 107.

[15] [15] Penetrante B M. Proc. of Ninth IEEE Int. Pulsed Power Conf., 1993. 1.

[16] [16] Mok Y S, Ham S W, Nam I S. IEEE Trans. Plasma Sci., 1998, 26(5): 1566.

[17] [17] Itikawa Y, Mason N. J. Phys. Chem. Ref. Data, 2005, 34(1): 1.

[18] [18] Popov N A. J. Phys. D: Appl. Phys., 2011, 44: 1.

[19] [19] Shimizu K, Oda T. Sci. Technol. Adv. Mater., 2001, 2: 577.