Opto-Electronic Engineering, Volume. 40, Issue 2, 100(2013)

Novel Projection Lens Design for Large-area PCB Lithography

DENG Yafei*, ZHOU Jinyun, LEI Liang, RAN Zuo, and ZHOU Yamei
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    References(4)

    [2] [2] WANG Feng-tao, LIU Fu-han, KONG Ling-hua. Proximity Lithography in Sub-10 Micron Circuitry for Packaging Substrate [J]. IEEE Transaction on Advanced Packaging, 2010, 33(4): 876-882.

    [3] [3] Jain K. A Large-Area High-Throughput High-Resolution Projection Imaging System: US, 5285236 [P]. 1994-08.

    [8] [8] Joseph M Geary. Introduction to Lens Design: With Practical ZEMAX Examples [M]. Willmann-Bell, Inc, 2002: 365-372.

    [9] [9] Plummer J D. Silicon VLSI Technology Fundamentals, Practice and Modeling [M]. Prentice Hall, 2003: 688-742.

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    [4] CHEN Huanan, GUO Kang, ZHANG Linghua, LIU Jian, SHANG Hongbo. Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective[J]. Opto-Electronic Engineering, 2015, 42(6): 50

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    DENG Yafei, ZHOU Jinyun, LEI Liang, RAN Zuo, ZHOU Yamei. Novel Projection Lens Design for Large-area PCB Lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 100

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    Paper Information

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    Received: Sep. 24, 2012

    Accepted: --

    Published Online: Mar. 5, 2013

    The Author Email: Yafei DENG (qqv100125@126.com)

    DOI:10.3969/j.issn.1003-501x.2013.02.016

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