For large-area and high-density Printed Circuit Board (PCB) lithography, we use ZEMAX optical design software to design a kind of lithographic projection lens with 8 optics element． Symmetrical double Gaussian structure is applied in the lens, the magnification is -1, and numerical aperture NA = 0.06. It can exposure a area of Φ = 80 mm at a time, and have better than 7 μm resolution and 120 μm focus shift．The result of tolerance analysis show that the tightest tolerance is part of the element tilts, which should be lower than 0.017 °. We use the Monte Carlo method to simulate fabricating and assembling 50 group of lens. The results show 90% of the lens MTF > 0.58 at spatial frequency 72 line/mm, which can ensure more than 90% yield when they are fabricated and assembled.