Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Chinese Journal of Lasers, Volume. 38, Issue 11, 1107001(2011)

Properties of Thin Films Prepared with End-Hall and APS Ion Assisted Deposition

Ai Wanjun1,2、* and Xiong Shengming1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (19)
    Cited By (2)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 2 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Ai Wanjun, Xiong Shengming. Properties of Thin Films Prepared with End-Hall and APS Ion Assisted Deposition[J]. Chinese Journal of Lasers, 2011, 38(11): 1107001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: materials and thin films

    Received: Jun. 23, 2011

    Accepted: --

    Published Online: Oct. 12, 2011

    The Author Email: Wanjun Ai (awj422177370@163.com)

    DOI:10.3788/cjl201138.1107001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology