A dielectric study on spark plasma sintered monoclinic HfO<sub>2</sub> processed through precursor route

S. S. Lokesh Vendra; Ekaterina Koroleva; Alexey Filimonov; Sergey Vakhrushev; Ravi Kumar

doi:10.1142/S2010135X24500371

Journal of Advanced Dielectrics, Volume. 15, Issue 3, 2450037(2025)

A dielectric study on spark plasma sintered monoclinic HfO₂ processed through precursor route

S. S. Lokesh Vendra¹, Ekaterina Koroleva², Alexey Filimonov³, Sergey Vakhrushev², and Ravi Kumar^1,4、*

¹Laboratory for High Performance Ceramics, Department of Metallurgical and Materials Engineering, Indian Institute of Technology-Madras (IIT Madras), Chennai 600036, India

²Neutron Research Laboratory, Ioffe Institute, St. Petersburg 194021, Russia

³Institute of Electronics and Telecommunications, Peter the Great St. Petersburg Polytechnic University, St. Petersburg 195251, Russia

⁴Research Center on Ceramic Technologies for Futuristic Mobility, Indian Institute of Technology-Madras (IIT Madras), Chennai 600036, India

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S. S. Lokesh Vendra, Ekaterina Koroleva, Alexey Filimonov, Sergey Vakhrushev, Ravi Kumar. A dielectric study on spark plasma sintered monoclinic HfO₂ processed through precursor route[J]. Journal of Advanced Dielectrics, 2025, 15(3): 2450037

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Paper Information

Category: Research Articles

Received: Jun. 9, 2024

Accepted: Dec. 25, 2024

Published Online: Jul. 7, 2025

The Author Email: Ravi Kumar (nvrk@iitm.ac.in)

DOI:10.1142/S2010135X24500371

CSTR:32405.14.S2010135X24500371

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