Journal of Advanced Dielectrics, Volume. 15, Issue 3, 2450037(2025)

A dielectric study on spark plasma sintered monoclinic HfO2 processed through precursor route

S. S. Lokesh Vendra1, Ekaterina Koroleva2, Alexey Filimonov3, Sergey Vakhrushev2, and Ravi Kumar1,4、*
Author Affiliations
  • 1Laboratory for High Performance Ceramics, Department of Metallurgical and Materials Engineering, Indian Institute of Technology-Madras (IIT Madras), Chennai 600036, India
  • 2Neutron Research Laboratory, Ioffe Institute, St. Petersburg 194021, Russia
  • 3Institute of Electronics and Telecommunications, Peter the Great St. Petersburg Polytechnic University, St. Petersburg 195251, Russia
  • 4Research Center on Ceramic Technologies for Futuristic Mobility, Indian Institute of Technology-Madras (IIT Madras), Chennai 600036, India
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    This work investigated the structure and dielectric behavior of precursor-derived spark plasma sintered (SPS) hafnium dioxide (HfO2). X-ray diffractograms confirmed the presence of monoclinic HfO2 (m-HfO2) and scanning electron micrographs revealed micron/nanosized grains and grain boundaries in SPS m-HfO2. The theoretical density of ceramics is 94%, and the porosity is very low. In the temperature interval of 25–200°C, the real part of the permittivity (ε) is almost frequency- and temperature-independent and the ε value is about 21 in the frequency range 102?106Hz. ε of SPS ceramics is higher than that of traditionally sintered HfO2 ceramics. At temperatures above 225°C, there is a sharp increase in the permittivity and loss at low measuring frequencies. In order to comprehend the underlying conduction mechanisms, an analysis of the dispersion dependences of the dielectric response was undertaken. High permittivity values were attributed to the space charge polarization mechanism occurring at grain boundaries due to the thermally activated movement of oxygen vacancies. The DC conductivity of SPS m-HfO2 is thermally activated, and conductivity is determined by oxygen vacancies through hopping mechanism.

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    S. S. Lokesh Vendra, Ekaterina Koroleva, Alexey Filimonov, Sergey Vakhrushev, Ravi Kumar. A dielectric study on spark plasma sintered monoclinic HfO2 processed through precursor route[J]. Journal of Advanced Dielectrics, 2025, 15(3): 2450037

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    Paper Information

    Category: Research Articles

    Received: Jun. 9, 2024

    Accepted: Dec. 25, 2024

    Published Online: Jul. 7, 2025

    The Author Email: Ravi Kumar (nvrk@iitm.ac.in)

    DOI:10.1142/S2010135X24500371

    CSTR:32405.14.S2010135X24500371

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