Fig. 1. Schematic diagram of experimental device

Fig. 2. Simulated electric field distributions in cross-section of resonant cavities with different substrate spacings. (a) 20 mm; (b) 30 mm

Fig. 3. Schematic diagram of uniform magnetic field and distribution of magnetic induction intensity. (a) Schematic diagram of uniform magnetic field; (b) distribution of magnetic induction intensity

Fig. 4. Images of plasma under uniform magnetic field with substrate spacing of 20 mm and 30 mm. (a) Substrate spacing is 20 mm, without magnetic field; (b) substrate spacing is 20 mm, with uniform magnetic field; (c) substrate spacing is 30 mm, without magnetic field; (d) substrate spacing is 30 mm, with uniform magnetic field

Fig. 5. Plasma emission spectra along the horizontal direction of the substrate surface without magnetic field and with uniform magnetic field when the substrate spacing is 20 mm and 30 mm. (a) Substrate spacing is 20 mm; (b) substrate spacing is 30 mm

Fig. 6. Distributions of H_α and H_β groups on the surface of the substrate and in the middle of the two substrates along the horizontal direction under the effect of no magnetic field and uniform magnetic field. (a) H_α on the surface of the substrate; (b) H_β on the surface of the substrate; (c) H_α in the middle of two substrates; (d) H_β in the middle of two substrates

Fig. 7. Distributions of plasma electron temperature on the surface of the substrate table and in the middle of the two substrates in the horizontal direction under the uniform magnetic field for substrate table spacing of 20 mm and 30 mm. (a) Surface of the substrate with a spacing of 20 mm; (b) between the two substrates with a spacing of 20 mm; (c) surface of the substrate with a spacing of 30 mm; (d) between two substrates with a spacing of 30 mm