Chinese Journal of Lasers, Volume. 28, Issue 6, 530(2001)

Research on Fabrication of 128×128 Element GaAs Concave Microlenses Array Device

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    References(4)

    [1] [1] M. Severi, P. Motter. Etching selectivity control during resist pattern transfer into silican for the fabrication of microlenses with reduced spherical aberration. Opt. Eng., 1999, 38(1):146~150

    [2] [2] M. B. Stern, T. R. Jay. Dry etching for coherent refractive microlens arrays. Opt. Eng., 1994, 33(11):3547~3552

    [3] [3] T. R. Jay, M. B. Stern, R. E. Knowlden. Effect of refractive microlens array fabrication parameters on optical quality. SPIE, 1992, 1751:236~245

    [4] [4] B. P. Keyworth, D. J. Corazza, J. N. Mcmallin et al.. Single-step fabrication of refractive microlens arrays. Appl. Opt., 1997, 36(10):2198~2201

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Research on Fabrication of 128×128 Element GaAs Concave Microlenses Array Device[J]. Chinese Journal of Lasers, 2001, 28(6): 530

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    Paper Information

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    Received: Apr. 20, 2000

    Accepted: --

    Published Online: Aug. 10, 2006

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