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Chinese Journal of Lasers, Volume. 36, Issue 2, 367(2009)

Chemical Kinetics Simulation for H+NCl3+HI Chemical Laser System

Li Liucheng1,2、*, Duo Liping1, and Yang Bailing1
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    Li Liucheng, Duo Liping, Yang Bailing. Chemical Kinetics Simulation for H+NCl3+HI Chemical Laser System[J]. Chinese Journal of Lasers, 2009, 36(2): 367

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    Paper Information

    Category: Laser physics

    Received: Jun. 20, 2008

    Accepted: --

    Published Online: Feb. 23, 2009

    The Author Email: Liucheng Li (liliucheng@dicp.ac.cn)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology