Chinese Journal of Lasers, Volume. 10, Issue 7, 399(1983)
Discharge characteristics of XeCl lasers
References(5)
[1] [1] A. J. Schwab, F. W. HolliBger; IEEE J. Quant. Electr., 1976, QE-12, No. 3,183.
[2] [2] C. P. Wang; Rev. Sci. Instrum., 1976, 47, No. 1, 92.
[3] [3] R. C. Sze, Τ. B. Loreej IEEE J. Qucmt. Electr., 1978, QE-14, No. 12, 944.
[4] [4] Chen Jianwen et al.; Appl. Phys. Lett., 1980, 37， 883.
[7] [7] A. E. Greene, C. A. Brau; IEEE J. Quant. Electr., 1978，QE-14, No. 1, 951.
Tools
Get Citation
Copy Citation Text
Chen Jianwen, Xia Kangmin, Liu Miaohong, Li Liquan, Fu Shufen. Discharge characteristics of XeCl lasers[J]. Chinese Journal of Lasers, 1983, 10(7): 399
Paper Information
Category: laser devices and laser physics
Received: Oct. 5, 1982
Accepted: --
Published Online: Aug. 31, 2012
The Author Email:
CSTR:32186.14.
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20