Subwavelength gratings， as compact， easily integrable polarization-selective devices with high extinction ratios， hold significant potential for applications in remote sensing， material stress detection， anti-scattering imaging， and related fields， garnering widespread attention. In this study， we design a one-dimensional subwavelength grating polarization-selective device with high extinction ratios and high transmittance， along with an efficient fabrication method. Utilizing the effective medium theory and finite-difference time-domain simulations， we developed and modeled a one-dimensional subwavelength grating device featuring a double-layer metal structure optimized for holographic interference processing. This design offers robust duty cycle tolerance and facilitates the direct transfer of photoresist patterns. A holographic laser lithography system was constructed to fabricate one-dimensional gratings with dimensions of 30 mm×30 mm and a period of 800 nm. Compared to conventional techniques， this approach demonstrates significant advantages in processing efficiency， cost-effectiveness， and tunable periodicity. The transfer of photoresist patterns to metal gratings was achieved via silicon substrate etching and metal film deposition. The resulting gratings exhibit an average transmittance exceeding 45% and a maximum extinction ratio of 30 dB for infrared wavelengths in the range of 3-15 μm.