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Chinese Journal of Lasers, Volume. 16, Issue 8, 487(1989)

Studv of a 20W XeCl excimer laser with hij h stability and high efficiency

Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, and Wang Jianye
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    [2] [2] Gary Klanminer, Laser & AppIIatiooa, September1986, 75

    [3] [3] Μ. Hiramatsu, Τ. Goto.Rev Sci. Instrum., 57 (4)534(1986)

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    Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, Wang Jianye. Studv of a 20W XeCl excimer laser with hij h stability and high efficiency[J]. Chinese Journal of Lasers, 1989, 16(8): 487

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    Paper Information

    Category: Laser physics

    Received: Nov. 14, 1988

    Accepted: --

    Published Online: Aug. 13, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology