Simulation study of the NAσ's dependence of DOF for 193-nm immersion lithography at 65-nm node

Guosheng Huang; Yanqiu Li

Chinese Optics Letters, Volume. 3, Issue 2, 0273(2005)

Guosheng Huang^1,2 and Yanqiu Li^1、*

Author Affiliations

¹The Institute of Electrical Engineering of Chinese Academy of Sciences, Beijing 100080

²Graduate School of Chinese Academy of Sciences, Beijing 100039

show less

References(4)

[1] [1] S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).

[2] [2] J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

[3] [3] C. A. Mack, Inside PROLITH^(TM), A Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Texas, USA, 1997).

[4] [4] S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

CLP Journals

[1] Zhou Yuan, Li Yanqiu. Optimization of Double Bottom Antireflective Coating for Hyper Numerical Aperture Lithography[J]. Acta Optica Sinica, 2008, 28(3): 472

Tools

Get Citation

Copy Citation Text

Guosheng Huang, Yanqiu Li, "Simulation study of the NAσ's dependence of DOF for 193-nm immersion lithography at 65-nm node," Chin. Opt. Lett. 3, 0273 (2005)

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category:

Received: Oct. 10, 2004

Accepted: --

Published Online: Jun. 6, 2006

The Author Email: Yanqiu Li (liyanq@mail.iee.ac.cn)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology