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Laser & Optoelectronics Progress, Volume. 57, Issue 8, 081101(2020)

Effects of Gap and Decenter of Mask on Narrow-Band Algorithm with Ideal Templates for Co-Phasing a Segmented Mirror

Yongfeng Zhang1,2,3、** and Hao Xian1,2、*
Author Affiliations
  • 1Key Laboratory of Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
  • 2Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
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    AbstractGet PDF(in Chinese)
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    Schematic of Cartesian coordinate system and relative position relationship between segment and mask

    Fig. 1. Schematic of Cartesian coordinate system and relative position relationship between segment and mask

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    Far field patterns without gap and mask decenter, corresponding to different piston errors. (a) 0; (b) π/11; (c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11

    Fig. 2. Far field patterns without gap and mask decenter, corresponding to different piston errors. (a) 0; (b) π/11; (c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11

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    Far field patterns from mask with different piston and gap, but without decenter. kδ equals (a) 0; (b) π/11; (c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11

    Fig. 3. Far field patterns from mask with different piston and gap, but without decenter. kδ equals (a) 0; (b) π/11; (c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11

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    Intensity distributions for different gaps in vertical direction when kδ=6π/11

    Fig. 4. Intensity distributions for different gaps in vertical direction when kδ=6π/11

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    Far field patterns from mask with different piston and decenter, but without gap. kδ equals (a) 0; (b) π/11;(c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11

    Fig. 5. Far field patterns from mask with different piston and decenter, but without gap. kδ equals (a) 0; (b) π/11;(c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11

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    Correlation coefficients between templates

    Fig. 6. Correlation coefficients between templates

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    Correlation coefficients between templates and far field patterns of mask with different gap and piston. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

    Fig. 7. Correlation coefficients between templates and far field patterns of mask with different gap and piston. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

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    Correlation coefficients between templates and far field patterns of mask with different gap. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

    Fig. 8. Correlation coefficients between templates and far field patterns of mask with different gap. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

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    Matching results between templates and far field patterns of mask with different gap. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

    Fig. 9. Matching results between templates and far field patterns of mask with different gap. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

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    Correlation coefficients between templates and far field patterns of mask with different decenter and piston. Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

    Fig. 10. Correlation coefficients between templates and far field patterns of mask with different decenter and piston. Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

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    Correlation coefficients between templates and far field patterns of mask with different decenter.Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

    Fig. 11. Correlation coefficients between templates and far field patterns of mask with different decenter.Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

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    Matching results between templates and far field patterns of mask with different decenter. Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

    Fig. 12. Matching results between templates and far field patterns of mask with different decenter. Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9

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    Yongfeng Zhang, Hao Xian. Effects of Gap and Decenter of Mask on Narrow-Band Algorithm with Ideal Templates for Co-Phasing a Segmented Mirror[J]. Laser & Optoelectronics Progress, 2020, 57(8): 081101

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    Paper Information

    Category: Imaging Systems

    Received: Jun. 5, 2019

    Accepted: Sep. 6, 2019

    Published Online: Apr. 3, 2020

    The Author Email: Yongfeng Zhang (zhangyongfeng15@mails.ucas.edu.cn), Hao Xian (xianhao@ioe.ac.cn)

    DOI:10.3788/LOP57.081101

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology