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Infrared and Laser Engineering, Volume. 46, Issue 7, 726001(2017)

Multi-exposure control method based on maximum local information entropy

Hou Xinglin1...2,3,*, Luo Haibo1,3,4, and Zhou Peipei13 |Show fewer author(s)
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    Hou Xinglin, Luo Haibo, Zhou Peipei. Multi-exposure control method based on maximum local information entropy[J]. Infrared and Laser Engineering, 2017, 46(7): 726001

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    Paper Information

    Category: 信息获取与辨识

    Received: Nov. 11, 2016

    Accepted: Dec. 3, 2016

    Published Online: Sep. 21, 2017

    The Author Email: Hou Xinglin (houxinglin@sia.cn)

    DOI:10.3788/irla201746.0726001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology