Chinese Journal of Lasers, Volume. 35, Issue s1, 161(2008)

Thin Films Thickness Calculation of Vanadium Dioxide Using as Laser Protection Material

Tian Xuesong*, Liu Jincheng, Li Lianjiang, Liu Jinbo, and Wang Qi
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    References(3)

    [2] [2] Ch. Fabjan, J. Garche, B. Harrer et al.. The vanadium redox-battery: an efficient storage unit for photovoltaic systems[J]. Electrochimica Acta, 2001, 47(5): 825~831

    [8] [8] Yi Li, Xinjian Yi, Tianxu Zhang. Nanostructure and thermal-optical properties of vanadium dioxide thin films[J]. Chinese Opt. Lett., 2005, 3(12): 719~721

    [9] [9] Francine C Case. Improved VO2 thin films for infrared switching[J]. Appl. Opt., 1991, 30(28): 4119~4123

    CLP Journals

    [1] Wang Ning, Shao Jianda, Yi Kui, Wei Chaoyang. Impact of Evaporation Characteristics of SiO2 on Uniformity of Thin-Film Thickness[J]. Chinese Journal of Lasers, 2010, 37(8): 2051

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    Tian Xuesong, Liu Jincheng, Li Lianjiang, Liu Jinbo, Wang Qi. Thin Films Thickness Calculation of Vanadium Dioxide Using as Laser Protection Material[J]. Chinese Journal of Lasers, 2008, 35(s1): 161

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    Paper Information

    Category: materials and thin films

    Received: --

    Accepted: --

    Published Online: Apr. 21, 2008

    The Author Email: Xuesong Tian (cedar@hit.edu.cn)

    DOI:

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