Fig. 1. Reflection spectra of samples with structure of glass/ITO-1/Ag/ITO-2/WO₃ before and after ion implantation for different thicknesses of ITO-2. (a) Before ion implantation; (b) after ion implantation

Fig. 2. Reflection spectra of metal films M (Au, Ag, and Cu respectively) for different thicknesses of ITO-2 layer

Fig. 3. Comparison of reflection spectra before and after samples with different metal films M and different thicknesses of ITO-2 layer when thickness of WO₃ layer is 250 nm. (a) Au; (b) Ag; (c) Cu

Fig. 4. Comparison of reflection spectra before and after samples with different metal films M and different thicknesses of ITO-2 layer when thickness of WO₃ layer is 400 nm. (a) Au; (b) Ag; (c) Cu

Fig. 5. Contour plots of R value of IAI structure varying with thicknesses of the bottom and top ITO layers when thickness of Ag is fixed at 5, 10, 15, and 20 nm. (a) 5 nm; (b) 10 nm; (c) 15 nm; (d) 20 nm

Fig. 6. Digital photos and test characterizations of DMD all-solid-state ECDs. (a) Digital photos of seven different colored DMD all-solid-state ECDs; (b) cross-sectional SEM image of red device; (c) SEM image of surface of WO₃ layer of red device; (d) cross-sectional EDS analysis results of red device

Fig. 7. Diagram of structure and variations of reflection spectra of DMD all-solid-state ECDs. (a) Diagram of structure of DMD all-solid-state ECDs; (b) variations of reflection spectra of red DMD all-solid-state ECDs