Chinese Journal of Lasers, Volume. 52, Issue 7, 0700001(2025)

Advances and Future Trends in Photolithography and Photoresist Materials

Lukui Xu, Zixiong Fan, Luwei Wang, Yong Guo, Yinru Zhu, Xinwei Gao, Wei Yan*, and Junle Qu
Author Affiliations
  • State Key Laboratory of Radio Frequency Heterogeneous Integration (Shenzhen University), Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, Guangdong, China
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    References(200)

    [23] Zhao H F, Zhou Z H, Zhang L. Research progress and prospects of extreme ultraviolet photoresists[J]. Chinese Journal of Lasers, 51, 1801002(2024).

    [86] Zhao H T, Su S H, Li C et al. Research progress on two-photon polymerization printing three-dimensional photonic crystals (invited)[J]. Chinese Journal of Lasers, 51, 1202402(2024).

    [99] Lee C H, Chang G, Kim J et al. Concurrent optimization of diffraction fields from binary phase mask for three-dimensional nanopatterning[J]. ACS Photonics, 10, 919-927(2023).

    [156] Dong X G, Shao Y A, Ping H H et al. Effect of metal oxide deposition on the sensitivity and resolution of E-beam photoresist[J]. ACS Applied Materials & Interfaces, 16, 56019-56030(2024).

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    Lukui Xu, Zixiong Fan, Luwei Wang, Yong Guo, Yinru Zhu, Xinwei Gao, Wei Yan, Junle Qu. Advances and Future Trends in Photolithography and Photoresist Materials[J]. Chinese Journal of Lasers, 2025, 52(7): 0700001

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    Paper Information

    Category: Research Articles

    Received: Nov. 18, 2024

    Accepted: Dec. 23, 2024

    Published Online: Apr. 14, 2025

    The Author Email: Wei Yan (weiyan@szu.edu.cn)

    DOI:10.3788/CJL241363

    CSTR:32183.14.CJL241363

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