Novel optical lithography using silver superlens

Haiyan Qin; Xuan Li; Su Shen

Chinese Optics Letters, Volume. 6, Issue 2, 02149(2008)

Haiyan Qin¹, Xuan Li¹, and Su Shen²

¹Centre for Optical and Electromagnetic Research, Zhejiang University, Joint Research Center of Photonics of the Royal Institute of Technology and Zhejiang University (JORCEP), Hangzhou 310058

²The Institute of Information Optical Engineering, Soochow University, Suzhou 215006

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CLP Journals

[1] Li Mujun, Shen Lianguan, Zhao Wei, Zheng Jinjin, Zhou Jie. Analysis of Effective Wave-Front Affecting Diffraction Field in Proximity Lithography[J]. Acta Optica Sinica, 2010, 30(2): 525

[2] Yang Yiwei, Shi Zheng. A New Optical Proximity Correction with Mapping Model between Segments and Control Sites[J]. Acta Optica Sinica, 2010, 30(6): 1667

[3] Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha, "All-reflective optical system design for extreme ultraviolet lithography," Chin. Opt. Lett. 8, 1082 (2010)

[4] Jiangnan Zhao, Guoxing Zheng, Song Li, Hui Zhou, Yue Ma, Ruiying Zhang, Yan Shi, Ping'an He, "A hyperlens-based device for nanoscale focusing of light," Chin. Opt. Lett. 10, 042302 (2012)

[5] Lichun Wang, Hongju Guo, Li Deng, Yang Xiang, Shangqing Gong, "Splitting and focusing of light with metal nano-slits coated with nonlinear Kerr medium," Chin. Opt. Lett. 8, 335 (2010)

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Haiyan Qin, Xuan Li, Su Shen, "Novel optical lithography using silver superlens," Chin. Opt. Lett. 6, 02149 (2008)

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Paper Information

Received: Aug. 30, 2007

Accepted: --

Published Online: Mar. 5, 2008

The Author Email:

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology