Chinese Journal of Lasers, Volume. 26, Issue 9, 811(1999)
Optical Thin Films for 980 nm High-power Semiconductor Laser Devices Formed by Electron Cyclotron Resonance Plasma
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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optical Thin Films for 980 nm High-power Semiconductor Laser Devices Formed by Electron Cyclotron Resonance Plasma[J]. Chinese Journal of Lasers, 1999, 26(9): 811
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