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Chinese Optics Letters, Volume. 4, Issue 10, 611(2006)

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
Author Affiliations
  • 1Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092
  • 2National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
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    [1] [1] M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, and J. P. Delaboudiniere, Proc. SPIE 5250, 99 (2004).

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    [3] [3] D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. M. Gullikson, C. C. Walton, L. Golub, and E. DeLuca, Proc. SPIE 5168, 1 (2004).

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    [8] [8] J. I. Larruquert, Opt. Soc. Am. A 19, 391 (2002).

    [9] [9] http://www.cxro.lbl.gov/.

    [10] [10] Z. Zhang, Z. Wang, F. Wang, W. Wu, H. Wang, S. Qin, and L. Chen, Chin. Opt. Lett. 3, 422 (2005).

    [11] [11] F. Wang, Z. Wang, S. Qin, W. Wu, Z. Zhang, H. Wang, and L. Chen, Chin. Opt. Lett. 3, 425 (2005).

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    CLP Journals

    [1] Junling Qin, Jianda Shao, Kui Yi, Zhengxiu Fan, "Interface roughness, surface roughness and soft X-ray reflectivity of Mo/Si multilayers with different layer number," Chin. Opt. Lett. 5, 301 (2007)

    [2] Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, Jingtao Zhu, "Mo/Si aperiodic multilayer broadband reflective mirror for 12.5–28.5-nm wavelength range," Chin. Opt. Lett. 9, 023102 (2011)

    [3] Liqin Liu, Zhanshan Wang, Jingtao Zhu, Zhong Zhang, Moyan Tan, Qiushi Huang, Rui Chen, Jing Xu, Lingyan Chen, "Intrinsic stress analysis of sputtered carbon film," Chin. Opt. Lett. 6, 384 (2008)

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], "B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm," Chin. Opt. Lett. 4, 611 (2006)

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    Paper Information

    Received: May. 29, 2006

    Accepted: --

    Published Online: Oct. 31, 2006

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology