Laser & Optoelectronics Progress, Volume. 62, Issue 13, 1300006(2025)

Progress in Optical Measurement and Detection of Tin Droplets for Extreme Ultraviolet Lithography Light Sources

Liwen Fu1,2,3 and Nan Lin1,2,3、*
Author Affiliations
  • 1School of Advanced Interdisciplinary Sciences, University of Chinese Academy of Sciences, Beijing 100049, China
  • 2State Key Laboratory of Ultra-Intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    Figures & Tables(13)
    Instability of droplet. (a) Lateral instability; (b) vertical instability
    Droplet generator. (a) Typical DOD droplet generator; (b) continuous droplet flow generator
    Schematic of double pulse scheme
    Working sequence of EUV light source
    Schematic of laser scattering synchronization
    Sample photodiode signal[17]
    Schematic of typical shadow imaging
    Intensity profiles of droplet images[24]
    Droplet image captured by shadow imaging
    Schematic of droplet parameter sensing and feedback control
    CE of different target profile created by pre-pulse[63]
    Side-on shadowgraphs of expanded microdroplets irradiated by laser of different intensities at 0.5 μs[65]
    • Table 1. Milestones in the development of commercial tin droplet target parameters

      View table

      Table 1. Milestones in the development of commercial tin droplet target parameters

      Listing of milestonesDiameter /µmLateral instability(σ) /μmVertical instability (σ) /μmVelocity /(m/s)
      2005 Cymer2660‒1203.2378
      2009 Cymer29-3050<1<111
      2017 ASML827<1<180

      2010 Gigaphoton31

      2011 Gigaphoton32

      60

      30

      20

      7

      20

      7

      60

      50

      2015 Gigaphoton38-39205548
      2024 Gigaphoton4910‒20<3<3>100
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    Liwen Fu, Nan Lin. Progress in Optical Measurement and Detection of Tin Droplets for Extreme Ultraviolet Lithography Light Sources[J]. Laser & Optoelectronics Progress, 2025, 62(13): 1300006

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    Paper Information

    Category: Reviews

    Received: Dec. 9, 2024

    Accepted: Jan. 6, 2025

    Published Online: Jul. 15, 2025

    The Author Email: Nan Lin (nanlin@siom.ac.cn)

    DOI:10.3788/LOP242388

    CSTR:32186.14.LOP242388

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