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Chinese Journal of Lasers, Volume. 47, Issue 5, 0500015(2020)

Polarization Control of Shanghai Soft X-Ray Free-Electron Laser Facility

Zhangfeng Gao1,2, Haixiao Deng1,3、*, Bo Liu1,3, and Dong Wang1,3
Author Affiliations
  • 1Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China
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    Figures&Tables (6)
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    Figures & Tables(6)
    Schematic of SXFEL-UF layout

    Fig. 1. Schematic of SXFEL-UF layout

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    Simulated power profiles and spectra. (a)(b) Linearly polarized beam; (c)(d) circularly polarized beam

    Fig. 2. Simulated power profiles and spectra. (a)(b) Linearly polarized beam; (c)(d) circularly polarized beam

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    Radiation power and polarization degree varying with beam energy change

    Fig. 3. Radiation power and polarization degree varying with beam energy change

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    Schematic of polarization switching

    Fig. 4. Schematic of polarization switching

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    Simulated power profiles and spectra. (a)(b) EPU1; (c)(d) EPU2

    Fig. 5. Simulated power profiles and spectra. (a)(b) EPU1; (c)(d) EPU2

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    Radiation power and polarization degree varying with beam energy. (a) Radiation power; (b) polarization degree

    Fig. 6. Radiation power and polarization degree varying with beam energy. (a) Radiation power; (b) polarization degree

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    Zhangfeng Gao, Haixiao Deng, Bo Liu, Dong Wang. Polarization Control of Shanghai Soft X-Ray Free-Electron Laser Facility[J]. Chinese Journal of Lasers, 2020, 47(5): 0500015

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    Paper Information

    Category: reviews

    Received: Sep. 16, 2019

    Accepted: Oct. 30, 2019

    Published Online: May. 12, 2020

    The Author Email: Deng Haixiao (denghaixiao@zjlab.org.cn)

    DOI:10.3788/CJL202047.0500015

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology