[1] [1] W. Cao, J. Ma, and C. Zhou, Chin. Opt. Lett. 10, 112301 (2012).

[2] [2] Y. Yang, H. Luo, X. Wang, F. Li, X. Huang, B. Feng, and F. Jing, Chin. Opt. Lett. 9, 041408 (2011).

[3] [3] J. Qiao, A. W. Schmid, L. J. Waxer, T. Nguyen, J. Bunkenburg, and C. Kingsley, Opt. Express 18, 10423 (2010).

[4] [4] D. H. Martz, H. T. Nguyen, D. Patel, J. A. Britten, D. Alessi, E. Krous, Y. Wang, M. A. Larotonda, J. George, B. Knollenberg, B. M. Luther, J. J. Rocca, and C. S. Menoni, Opt. Express 17, 23809 (2009).

[5] [5] S. Hocquet, J. Neauport, and N. Bonod, Appl. Phys. Lett. 99, 061101 (2011).

[6] [6] J. A. Britten, Lawrence Livermore National Laboratory, Livermore, LLNL-BOOK-401125 (2008).

[7] [7] P. P. Lu, K.-X. Sun, R. L. Byer, J. A. Britten, H. T. Nguyen, J. D. Nissen, C. C. Larson, M. D. Aasen, T. C. Carlson, and C. R. Hoaglan, Opt. Lett. 20, 1708 (2009).

[8] [8] M. Mariton, "Jobin Yvon diffraction gratings: a core technology and its applications",http://www.horiba.com/uploads/media/RE06-04-016.pdf (2003).

[9] [9] C. G. Chen, P. T. Konkola, R. K. Heilmann, C. Joo, and M. L. Schattenburg, Proc. SPIE 4936, 126 (2002).

[10] [10] Y. Zhao, "Ultra-high precision scanning beam interference lithography and its application" PhD. Thesis (Massachusetts Institute of Technology, 2008).

[11] [11] M. Schattenburg and P. N. Everett, "A method and system for interference lithography utilizing phase locked beams" Patent US 6,882,477 B1 (2005).

[12] [12] K. Jain, M. Zemel, and M. Klosner, Proc. IEEE 90, 1681 (2002).